HfO2-based thin films and devices
Guest editors:
Prof. Xiaoguang LI
University of Science and Technology of China, Hefei, China
Assoc. Prof. Min Hyuk PARK
Seoul National University, Seoul, South Korea
Prof. Jiyan DAI
The Hong Kong Polytechnic University, Hung Hom, Hong Kong
Prof. Yuewei YIN
University of Science and Technology of China, Hefei, China
Special issue information:
Journal of Materiomics (JMAT), indexed in SCI (Impact Factor of 8.4 in 2023) and Scopus (Citescore of 14.3), is a leading academic journal that publishes cutting-edge research in the general field of materials science, particularly systematic studies of the relationships among composition, processing, structure, property, and performance of advanced materials.
The topics that the special issue will include, but not be limited to:
Advanced synthesis and characterization techniques for HfO2-based thin films.
Theoretical and experimental studies of dielectric and ferroelectric properties.
Memory devices and neuromorphic computing.
Dielectric energy storage.
Manuscript submission information:
Authors should prepare their manuscripts following the online submission page of Journal ofMateriomics at http://www.journals.elsevier.com/journal-of-materiomics.
Manuscript submission due date: January 31st, 2025
Keywords:
HfO2-based thin films, dielectric, ferroelectric, Memory devices, neuromorphic computing, Dielectric energy storage
Journal of Materiomics的CAR指数
2023年3月份科睿唯安官方一次性踢除35本SCI期刊，多数涉及学术诚信问题，让我们意识到学术期刊的“被踢”指数，也很重要。目前，对于期刊的“被踢”指数，这里介绍一下：CAR指数（关于CAR的详细介绍，请关注：www.jcarindex.com），这是一种评价期刊学术诚信风险的指数，指数越高代表可能的风险越大。从数据看，Journal of Materiomics不管是2022年度，还是2023年度的CAR指数，都是比较低的。当然，CAR指数仅供参考，期刊风险情况，需以科睿唯安或中科院预警等官方为准！
让推送更美好~
